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美国萨凡纳艺术与设计学院服装留学要求

2021-09-16 14:29    来源:留学在线       阅读量:

说道服装设计留学,美国SCAD深得众多艺术生的青睐。那么美国萨凡纳艺术与设计学院服装留学要求是什么呢?下面让我们看一下详情。

一、院校介绍

SCAD是全美最大的艺术学院,也是全球最大的专门艺术大学之一。位于佐治亚州有着200多年的历史古城萨凡纳市。由于整个城市的古建筑保存完好,这里被人们称为美国最美丽的城市之一。学院建筑系的教学楼是一座建于1887年的古屋,而整个城市更像是一座活生生的建筑博物馆,有着百年历史的建筑随处可见,现在仍旧有人居住和使用。

院校排名:萨凡纳艺术与设计学院在2019QS世界大学专业排名(艺术&设计)中,名列世界第47,美国第16。

School of Design设计学院:

设计学院下面设有以下几个系:可持续设计(Design for sustainability)MA,设计管理(Design management)MA、MFA,纤维(Fibers),工业设计(Industrial design)BFA / MA、MFA,珠宝设计系(Jewelry and objects)BFA / MA、MFA,服务设计(Service design)BFA / MFA。这些专业都是在萨凡纳校区上课。

二、服装设计申请要求

申请专业

M.F.A. in fashion 90学时

作品集要求

Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.

托福/雅思要求:

SCAD's TOEFL institution code is 5631.

申请专业

M.A. in fashion 45学时

作品集要求

Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.

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